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Silicon technologies

Additional authors: Baudrant, Annie. | ebrary, Inc.
Published by : ISTE ; | Wiley, (London : | Hoboken, N.J. :) Physical details: xvii, 337 p. : ill.
Subject(s): Semiconductor doping. | Ion implantation. | Semiconductors -- Heat treatment. | Electronic books.
Year: 2011
Online resources:
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Includes bibliographical references and index.

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Electronic reproduction. Palo Alto, Calif. : ebrary, 2015. Available via World Wide Web. Access may be limited to ebrary affiliated libraries.

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