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Computational lithography

by Ma, Xu,
Additional authors: Arce, Gonzalo R. | ebrary, Inc.
Series: Wiley series in pure and applied optics Published by : Wiley-Blackwell, (Oxford :) Physical details: xv, 226 p. : ill.
Subject(s): Microlithography -- Mathematics. | Integrated circuits -- Design and construction -- Mathematics. | Photolithography -- Mathematics. | Semiconductors -- Etching -- Mathematics. | Resolution (Optics) | Electronic books.
Year: 2010
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Includes bibliographical references and index.

Electronic reproduction. Palo Alto, Calif. : ebrary, 2011. Available via World Wide Web. Access may be limited to ebrary affiliated libraries.

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