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High-k gate dielectrics for CMOS technology

Additional authors: He, Gang. | Sun, Zhaoqi. | ebrary, Inc.
Published by : Wiley-VCH, (Weinheim :) Physical details: xxxi, 558 p. : ill. (some col.)
Subject(s): Dielectrics. | Metal oxide semiconductors, Complementary. | Electronic books.
Year: 2012
Online resources:
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Includes bibliographical references and index.

pt. 1. Scaling and challenging of Si-based CMOS -- pt. 2. High-k deposition and materials characterization -- pt. 3. Challenge in interface engineering and electrode -- pt. 4. Development in non-Si-based CMOS technology -- pt. 5. High-k Application in novel devices -- pt. 6. Challenge and directions.

Electronic reproduction. Palo Alto, Calif. : ebrary, 2013. Available via World Wide Web. Access may be limited to ebrary affiliated libraries.

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